Manufacturing method of roller used for manufacturing patterned retardation film

ABSTRACT

A manufacturing method of a roller used for manufacturing a patterned retardation film is provided. The manufacturing method includes the following steps. A roller having a rotational axis and a roller surface is provided. An engraving device having an engraving end is provided. The engraving end has a plurality of sub-micron slots which are constructed in parallel with each other. The engraving device engraves the roller surface with a first depth to form a plurality of first sub-micron grooves. The engraving device engraves the roller surface with a second depth to form a plurality of second sub-micron grooves.

This application claims the benefit of Taiwan application Serial No. 100120609, filed Jun. 13, 2011, the subject matter of which is incorporated herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The invention relates in general to a manufacturing method of a roller, and more particularly to a manufacturing method of a roller used for manufacturing a patterned retardation film.

2. Description of the Related Art

Along the advance in the display technology, a patterned retardation film is provided accordingly. Different optical phase retardations can be generated through the use of the patterned retardation film, so as to generate stereo visual effect. The patterned retardation film can be used in the 3D display technology such as 3D glasses, 3D TV and so on.

The patterned retardation film must maintain a certain level of precision so as to assure its optical quality. In order to meet the precision standard, the manufacturing speed of the patterned retardation film cannot be effectively increased. Therefore, the research personnel are dedicated to providing a tool which can quickly and precisely manufacture the patterned retardation film to meet the needs of the industries.

SUMMARY OF THE INVENTION

The invention is directed to a manufacturing method of a roller used for manufacturing a patterned retardation film. An engraving device is used for engraving a roller to form various particular patterns on the surface of the roller. The roller with particular patterns can promptly and precisely manufacture a patterned retardation film by way of embossing.

According to an aspect of the present invention, a manufacturing method of a roller used for manufacturing a patterned retardation film is provided. The manufacturing method includes the following steps. A roller having a rotational axis and a roller surface is provided. An engraving device having an engraving end is provided, wherein the engraving end has a plurality of sub-micron slots which are constructed in parallel with each other. The engraving device engraves the roller surface with a first depth along a roller rotational direction to form a plurality of first regions with a plurality of first sub-micron grooves. The first sub-micron grooves are substantially parallel to the roller rotational direction. The engraving device engraves the roller surface with a second depth along the roller rotational direction to form a plurality of second regions with a plurality of second sub-micron grooves. The second sub-micron grooves are substantially parallel to the roller rotational direction. The first region with the first sub-micron grooves and the second region with the second sub-micron grooves are formed on the roller surface alternately.

According to another aspect of the present invention, a manufacturing method of a roller used for manufacturing a patterned retardation film is provided. The manufacturing method includes the following steps. A roller having a rotational axis and a roller surface is provided. An engraving device having an engraving end is provided, wherein the engraving end has a plurality of sub-micron slots which are constructed in parallel with each other. The engraving device engraves the roller surface with a first depth along a direction of a 37°-53° angle with respect to a roller rotational direction to form a plurality of first sub-micron grooves on the roller surface. The engraving device engraves the roller surface with a second depth along the roller rotational direction to form a plurality of second regions with a plurality of second sub-micron grooves, wherein the second sub-micron grooves are substantially parallel to the roller rotational direction. The second regions with second sub-micron grooves are spaced with a distance to the width of the second regions.

According to yet another aspect of the present invention, a manufacturing method of a roller used for manufacturing a patterned retardation film is provided. The manufacturing method includes the following steps. A roller having a rotational axis and a roller surface is provided. An engraving device having an engraving end is provided, wherein the engraving end has a plurality of sub-micron slots arranged in parallel. The engraving device engraves the roller surface with a first depth along a perpendicular direction which is perpendicular to a roller rotational direction to form a plurality of first sub-micron grooves on the roller surface. The engraving device engraves the roller surface with a second depth along the roller rotational direction to form a plurality of second regions with a plurality of second sub-micron grooves, wherein the second sub-micron grooves are substantially parallel to the roller rotational direction. The second regions with second sub-micron grooves are spaced with a distance to width of the second regions.

The above and other aspects of the invention will become better understood with regard to the following detailed description of the preferred but non-limiting embodiment(s). The following description is made with reference to the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows a flowchart of a manufacturing method of a roller used for manufacturing a patterned retardation film of the first embodiment;

FIGS. 2A to 2D show the processing in each step of FIG. 1;

FIG. 3 shows an explosion diagram of a patterned retardation film manufactured by the roller of the first embodiment;

FIG. 4 shows a flowchart of a manufacturing method of a roller used for manufacturing a patterned retardation film of the second embodiment;

FIGS. 5A to 5B show the processing in each step of FIG. 4;

FIG. 6 shows an explosion diagram of a patterned retardation film manufactured by the roller of the second embodiment;

FIG. 7 shows a flowchart of a manufacturing method of a roller used for manufacturing a patterned retardation film;

FIGS. 8A to 8B show the processing in each step of FIG. 7; and

FIG. 9 shows an explosion diagram of a patterned retardation film manufactured by the roller of the third embodiment.

DETAILED DESCRIPTION OF THE INVENTION

A number of embodiments are disclosed for detailed descriptions of the invention. An engraving device is used for engraving the roller to form various particular patterns on the roller. The roller with particular patterns can quickly and precisely manufacture a patterned retardation film by embossing. However, the embodiments are for exemplification purpose only, not for limiting the scope of protection of the invention. In addition, in the embodiments, a part of the elements are omitted to highlight the technical features of the invention.

First Embodiment

Referring to FIG. 1 and FIGS. 2A to 2D. FIG. 1 shows a flowchart of a manufacturing method of a roller 100 used for manufacturing a patterned retardation film 600 (illustrated in FIG. 3) of the first embodiment. FIGS. 2A to 2D show the processing in each step of FIG. 1. Firstly, the method begins at step S101, as indicated in FIG. 2A, a roller 100 having a rotational axis 100 c and a roller surface 100 a is provided. Before the engraving process, the roller surface 100 a is the surface of a smooth cylinder. That is, all the diameters 100 d along the rotational axis 100 c are the same, and the vertical distance from any point on the roller surface 100 a to the rotational axis 100 c is substantially equivalent. In the present embodiment of the invention, the roller 100 is formed by a material such as copper (Cu).

Next, the method proceeds to step S102, as indicated in FIG. 2B, an engraving device 900 having an engraving end 910 is provided, wherein the engraving end 910 has a plurality of sub-micron slots 911 which are constructed in parallel with each other. The hardness of the engraving end 910 is harder than that of the roller 100, and can be formed by such as diamond. The width W911 of the sub-micron slots 911 is substantially equivalent to the interval D911.

Then, the method proceeds to step S103, as indicated in FIG. 2C, the engraving device 900 engraves the roller surface 100 a with a first depth D1 along a roller rotational direction C1 to form a plurality of first regions 110.

Then, the method proceeds to step S103, the sub-micron slots 911 (illustrated in FIG. 2B) of the engraving device 900 form a plurality of first sub-micron grooves 111 on the first regions 110, wherein each of the first sub-micron grooves 111 are substantially parallel to the roller rotational direction C1.

The width W900 of the engraving device 900 determines the width W110 of each first region 110, so the width W900 of the engraving device 900 of step S102 determines the width W110 of each first region 110 of step S103.

In the present step, the roller 900 is rotated around the rotational axis 100 c, and the engraving device 900 vertically engraves the roller surface 100 a to form a circle of first region 110 with the first sub-micron grooves 111 along the roller surface 100 a. Then, the engraving device 900 and the roller 100 are separated with respect to each other (for example, the engraving device 900 moves away from the roller 100, or the roller 100 moves away from the engraving device 900). Then, the engraving device 900 and the roller 100 move with respect to each other for a predetermined distance D110 along the rotational axis 100 c (for example, the engraving device 900 moves along the rotational axis 100 c, or the roller 100 moves along the rotational axis 100 c). Then, the engraving device 900 and the roller 100 are closed with respect to each other (for example, the engraving device 900 moves towards the roller 100, or the roller 100 moves towards the engraving device 900) to form another circle of first region 110 with the first sub-micron grooves 111.

The predetermined distance for which the engraving device 900 and the roller 100 move with respect to each other along the rotational axis 100 c is such as the width W900 of the engraving device 900, so that the predetermined distance D110 between the first regions 110 is substantially equal to the width W110 of the first region 110.

Then, the method proceeds to step S104, the engraving device 900 engraves the roller surface 100 a with a second depth D2 along the roller rotational direction C1 to form a plurality of second regions 120. In an enlargement of FIG. 2D, the roller surface 100 a before engraving is depicted in dotted lines to illustrate the size of the second depth D2. The first depth D1 is smaller than the second depth D2. In the present embodiment of the invention, the first depth D1 ranges between 1 to 20 μm, and the second depth D2 ranges between 1 to 20 μm.

The sub-micron slots 910 (illustrated in FIG. 2B) of the engraving device 900 form a plurality of second sub-micron grooves 121 on the second regions 120, wherein each of the second sub-micron grooves 121 are substantially parallel to the roller rotational direction C1.

The width W900 of the engraving device 900 determines the width W120 of each second region 120 with the second sub-micron grooves 121.

Then, the method proceeds to step S104, the relative movement between the roller 100 and the engraving device 900 is similar to that in step S103. That is, the roller 100 is rotated around the rotational axis 100 c, and the engraving device 900 vertically engraves the roller surface 100 a so as to form a circle of second region 120 with the second sub-micron grooves 121 between two of the first regions 110 with the first sub-micron grooves 111 along the roller surface 100 a. Then, the engraving device 900 and the roller 100 are separated with respect to each other (for example, the engraving device 900 moves away from the roller 100, or the roller 100 moves away from the engraving device 900). Then, the engraving device 900 and the roller 100 move with respect to each other for the width W110 of the first region 110 along the rotational axis 100 c (for example, the engraving device 900 moves along the rotational axis 100 c, or the roller 100 moves along the rotational axis 100 c). Then, the engraving device 900 and the roller 100 are closed with respect to each other (for example, the engraving device 900 moves towards the roller 100, or the roller 100 moves towards the engraving device 900) to form another circle of second region 120 with the second sub-micron grooves 121.

Thus, the engraving device 900 can alternately form the first regions 110 with the first sub-micron grooves 111 and the second regions 120 with the second sub-micron grooves 121 along the roller surface 100 a with the first depth D1 and the second depth D2. Furthermore, both each of the first sub-micron groove 111 and each of the second sub-micron groove 121 are substantially parallel to each other, and substantially perpendicular to the direction of the rotational axis 100 c.

Referring to FIG. 3, an explosion diagram of a patterned retardation film 600 manufactured by the roller 100 of the first embodiment is shown. The roller 100 is used for embossing the phase retardation pattern 610 on a resin layer of a base substrate 601. The first sub-micron structures 611 transferred from the first sub-micron grooves 111 are at a lower position, and the second sub-micron structures 621 transferred from the second sub-micron grooves 121 are at a higher position. After a polymerizable liquid crystal layer 620 is coated on the phase retardation pattern 610, a patterned retardation film 600 with phase retardation effect is formed.

Second Embodiment

Referring to FIG. 4 and FIGS. 5A to 5B. FIG. 4 shows a flowchart of a manufacturing method of a roller 200 used for manufacturing a patterned retardation film 700 (illustrated in FIG. 6) of the second embodiment. FIGS. 5A to 5B show the processing in each step of FIG. 4. The flowchart of a manufacturing method of a roller 200 used for manufacturing a patterned retardation film 700 of the present embodiment of the invention is different from the manufacturing method of a roller 100 used for manufacturing a patterned retardation film 600 of the first embodiment in step S203, and other similarities are not repeated here.

Following steps S201 to S202, the method proceeds to step S203. In step S203, as indicated in FIG. 5A, the engraving device 900 engraves the roller surface 200 a with first depth D1 along a direction of a 37°-53° angle with respect to the roller rotational direction C2 to form a plurality of first sub-micron grooves 211 on the roller surface 200 a.

In the present step, the roller 200 is rotated around the rotational axis 200 c. When the roller 200 is rotated, the engraving device 900 is moved along the rotational axis 200 c to engrave the roller surface 200 a with the first depth D1. By properly controlling the rotation speed of the roller 200 and the movement speed of the engraving device 900 (for example, the two speed are controlled to be the same with each other), a plurality of first sub-micron grooves 211 can be formed on the roller surface 200 a at an angle of 37°-53° with respect to the rotational axis 200 c.

Then, the method proceeds to step S203, since the engraving device 900 engraves the roller 200 at an angle of 37°-53° with respect to the rotational axis 200 c from one end of the roller to the other end of the roller, the first sub-micron grooves 211 form a spiral structure. In the present step, after the engraving device 900 changes the starting point of engraving, the engraving device 900 engraves the roller 200 again at an angle of 37°-53° with respect to the rotational axis 200 c to make the spiral first sub-micron grooves 211 spread over the roller 200.

Then, the method proceeds to step S204, as indicated in FIG. 5B, the engraving device 900 engraves the roller surface 200 c to form a plurality of second regions 220 along the roller rotational direction 200 c in a way similar to step S104. The sub-micron slots 911 (illustrated in FIG. 2) form a plurality of second sub-micron grooves 221 on the second regions 220, wherein the second sub-micron grooves 221 are substantially parallel to the roller rotational direction C1.

Thus, the engraving device 900 can alternately form the first sub-micron grooves 211 and the second sub-micron grooves 221 along the roller surface 200 with different depths. Moreover, the first sub-micron grooves 211 are 37°-53° with respect to the rotational axis 200 c, and the second sub-micron grooves 221 are substantially perpendicular to the rotational axis 200 c.

Referring to FIG. 6, an explosion diagram of a patterned retardation film 700 manufactured by the roller 200 of the second embodiment is shown. The roller 200 is used for embossing phase retardation pattern 710 on a resin layer of a base substrate 701. The first sub-micron structures 711 transferred from the first sub-micron grooves 211 are at a lower position, and the second sub-micron structures 721 transferred from the second sub-micron grooves 221 are at a higher position. After a polymerizable liquid crystal layer 720 is coated on the phase retardation pattern 710, a patterned retardation film 700 with phase retardation effect is formed.

Third Embodiment

Referring to FIG. 7 and FIGS. 8A to 8B. FIG. 7 shows a flowchart of a manufacturing method of a roller 300 used for manufacturing a patterned retardation film 800 (illustrated in FIG. 9). FIGS. 8A to 8B show the processing in each step of FIG. 7. The flowchart of a manufacturing method of a roller 300 used for manufacturing a patterned retardation film 800 of the present embodiment of the invention is different from the manufacturing method of a roller 100 used for manufacturing a patterned retardation film 600 of the first embodiment in step S303, and other similarities are not repeated here.

Following steps S301 to S302, the method proceeds to step S303. In step S303, as indicated in FIG. 8A, the engraving device 900 engraves the roller surface 300 a with the first depth D1 in a perpendicular direction which is perpendicular to the roller rotational direction C1 (as the roller 300 is not rotated in FIG. 8A, the roller rotational direction C1 is illustrated in FIG. 8B) to form a plurality of first sub-micron grooves 311 on the roller surface 300 a.

In the present step, the roller 300 is fixed. The engraving device 900 is moved along a direction perpendicular to the roller rotational direction C1 to engrave the roller surface 300 a with the first depth D1.

Then, the method proceeds to step S303, since the engraving device 900 engrave the roller 300 along the perpendicular direction, the first sub-micron grooves 311 form a horizontal lines structure. In the present step, after the engraving device 900 changes the starting point of engraving, the engraving device 900 engraves the roller 300 again at the perpendicular direction to make the first sub-micron grooves 311 of horizontal lines spread over the roller 300.

Then, the method proceeds to step S304, as indicated in FIG. 8B, the engraving device 900 engraves the roller surface 300 to form a plurality of second regions 320 along the roller rotational direction 300 c in a way similar to step S104. The sub-micron slots 911 (illustrated in FIG. 2) form a plurality of second sub-micron grooves 321 on the second regions 320, wherein the second sub-micron grooves 321 are substantially parallel to the roller rotational direction C1.

Thus, the engraving device 900 can alternately form the first sub-micron grooves 311 and the second sub-micron grooves 321 along the roller surface 300 with different depths. Moreover, the first sub-micron grooves 311 are substantially parallel to the rotational axis 300 c, and the second sub-micron grooves 321 are substantially perpendicular to the rotational axis 300 c. And the second regions 320 with the second sub-micron grooves 321 are spaced with a distance to the width of the second regions 320.

Referring to FIG. 9, an explosion diagram of a patterned retardation film 800 manufactured by the roller 300 of the third embodiment is shown. The roller 300 is used for embossing phase retardation pattern 810 on a resin layer of a base substrate 801. The first sub-micron structures 811 transferred from the first sub-micron grooves 311 are at a lower position, and the second sub-micron structures 821 transferred from the second sub-micron grooves 321 are at a higher position. After a polymerizable liquid crystal layer 820 is coated on the phase retardation pattern 810, a patterned retardation film 800 with phase retardation effect is formed.

While the invention has been described by way of example and in terms of the preferred embodiment(s), it is to be understood that the invention is not limited thereto. On the contrary, it is intended to cover various modifications and similar arrangements and procedures, and the scope of the appended claims therefore should be accorded the broadest interpretation so as to encompass all such modifications and similar arrangements and procedures. 

1. A manufacturing method of a roller used for manufacturing a patterned retardation film comprising: providing a roller having a rotational axis and a roller surface; providing an engraving device having an engraving end, wherein the engraving end has a plurality of sub-micron slots arranged in parallel; engraving the roller surface with a first depth along the roller rotational direction to form a plurality of first regions with a plurality of first sub-micron grooves on the first regions by the engraving device, wherein the first sub-micron grooves are substantially parallel to the roller rotational direction; and engraving the roller surface with a second depth along the roller rotational direction to form a plurality of second regions with a plurality of second sub-micron grooves on the second regions by the engraving device, wherein the second sub-micron grooves are substantially parallel to the roller rotational direction; wherein, the first regions with the first sub-micron grooves and the second regions with the second sub-micron grooves are formed on the roller surface alternately.
 2. The manufacturing method of a roller used for manufacturing a patterned retardation film according to claim 1, wherein the first depth is smaller than the second depth.
 3. The manufacturing method of a roller used for manufacturing a patterned retardation film according to claim 1, wherein the width of the engraving device is substantially equal to the width of each first region and the width of each second region.
 4. A manufacturing method of a roller used for manufacturing a patterned retardation film comprising: providing a roller having a rotational axis and a roller surface; providing an engraving device having an engraving end, wherein the engraving end has a plurality of sub-micron slots arranged in parallel; engraving the roller surface with a first depth along a direction of a 37°-53° angle with respect to a roller rotational direction by the engraving device to form a plurality of first sub-micron grooves on the roller surface; and engraving the roller surface with a second depth along the roller rotational direction to form a plurality of second regions with a plurality of second sub-micron grooves by the engraving device, wherein the second sub-micron grooves are substantially parallel to the roller rotational direction; wherein, the second regions with second sub-micron grooves are formed with an equal distance.
 5. The manufacturing method of a roller used for manufacturing a patterned retardation film according to claim 4, wherein the step of engraving the first sub-micron grooves further comprises: rotating the roller around the rotational axis; and moving the engraving device along the rotational axis from one end of the roller to the other end to engrave the rotating roller surface with the first depth.
 6. The manufacturing method of a roller used for manufacturing a patterned retardation film according to claim 4, wherein the step of engraving the second sub-micron grooves further comprises: rotating the roller around the rotational axis; and engraving the roller surface with the second depth by the engraving device.
 7. The manufacturing method of a roller used for manufacturing a patterned retardation film according to claim 4, wherein the step of engraving the second sub-micron grooves is performed after the step of engraving the first sub-micron grooves.
 8. A manufacturing method of a roller used for manufacturing a patterned retardation film comprising: providing a roller having a rotational axis and a roller surface; providing an engraving device having an engraving end, wherein the engraving end has a plurality of sub-micron slots arranged in parallel; engraving the roller surface with a first depth along a perpendicular direction which is perpendicular to a roller rotational direction by the engraving device to form a plurality of first sub-micron grooves on the roller surface; and engraving the roller surface with a second depth along the roller rotational direction by the engraving device to form a plurality of second regions with a plurality of second sub-micron grooves by the engraving device, wherein the second sub-micron grooves are substantially parallel to the roller rotational direction; wherein the second regions with the second sub-micron grooves are spaced with a distance to width of the second regions.
 9. The manufacturing method of a roller used for manufacturing a patterned retardation film according to claim 8, wherein the step of engraving the first sub-micron grooves comprises: moving the engraving device along a direction perpendicular to the roller rotational direction to engrave the roller surface with the first depth.
 10. The manufacturing method of a roller used for manufacturing a patterned retardation film according to claim 8, wherein the step of engraving the second sub-micron grooves comprises: rotating the roller around the rotational axis; and engraving the roller surface with the second depth by the engraving device.
 11. The manufacturing method of a roller used for manufacturing a patterned retardation film according to claim 8, wherein the step of engraving the second sub-micron grooves is performed after the step of engraving the first sub-micron grooves. 